B. Mortini

$1.62\mu \mathrm{m}$ Global Shutter Quantum Dot Image Sensor Optimized for Near and Shortwave Infrared

Jonathan S. Steckel, E. Josse, Andras G. Pattantyus‐Abraham et al. · 2021 IEEE International Electron Devices Meeting (IEDM) · 2021 · 52 citations

Natural Sciences, Materials Engineering, Materials Science +17

Resist processes for hybrid (electron-beam/deep ultraviolet) lithography

S. Tedesco, Thierry Mourier, B. Dal’zotto et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 30 citations

Engineering, Electrical Engineering, Materials Science +9

Study of mechanisms involved in photoresist microlens formation

Stéphanie Audran, B. Faure, B. Mortini et al. · Microelectronic Engineering · 2006 · 22 citations

Engineering, Materials Engineering, Materials Science +9

Study of dynamical formation and shape of microlenses formed by the reflow method

Stéphanie Audran, B. Faure, B. Mortini et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 20 citations

Engineering, Materials Engineering, Materials Science +12

Dynamical formation of microlenses by the reflow method: numerical simulation and experimental study of the process fabrication

Stéphanie Audran, B. Mortini, Benoît Faure et al. · Journal of Micromechanics and Microengineering · 2010 · 18 citations

Engineering, Materials Engineering, Materials Science +17