Philipp Naujok - Concepedia

Author

Philipp Naujok

Fraunhofer Institute for Applied Optics and Precision Engineering

Also Known As

Naujok, Philipp, P. Naujok, Philipp Naujok

Publications

199

Citations

H-Index

Concepts

All Affiliations

Fraunhofer Institute for Applied Optics and Precision Engineering Friedrich Schiller University Jena Physikalisch-Technische Bundesanstalt IMEC Ghent University

About

Philipp Naujok is an author at Fraunhofer Institute for Applied Optics and Precision Engineering specializing in applied physics, engineering, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	4	4	77
2	Applied Physics	4	4	77
3	Materials Science	4	4	77
4	Materials Engineering	1	1	21
5	Physics	1	1	21

Philipp Naujok

Publications

154

Citations

H-Index

Page 1

	Year	Citations
AZO/Ag/AZO transparent conductive films: correlation between the structural, electrical, and optical properties and development of an optical model Astrid Bingel, Olaf Stenzel, Philipp Naujok, Optical Materials Express	2016	28
Study of novel EUVL mask absorber candidates Meiyi Wu, Devesh Thakare, Jean‐François de Marneffe, Journal of Micro/Nanopatterning Materials and Metrology Mask PatterningShort Wavelength OpticOptical MaterialsEngineeringMask 3D	2021	23
La/B_4C multilayer mirrors with an additional wavelength suppression Philipp Naujok, Sergiy Yulin, Anna Bianco, Optics Express Materials SciencePhotonicsShort Wavelength OpticOptical MaterialsEngineering	2015	21
Influence of the ZnO:Al dispersion on the performance of ZnO:Al/Ag/ZnO:Al transparent electrodes Astrid Bingel, Martin Steglich, Philipp Naujok, Thin Solid Films Materials EngineeringMaterials ScienceAluminium NitrideEngineeringElectrode-electrolyte Interface	2016	21
Time-frequency analysis assisted determination of ruthenium optical constants in the sub-EUV spectral range 8 nm – 23.75 nm Qais Saadeh, Philipp Naujok, Vicky Philipsen, Optics Express	2021	14
Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask Meiyi Wu, Jean‐François de Marneffe, Karl Opsomer, Micro and Nano Engineering	2021	13
Thermal stability of B-based multilayer mirrors for next generation lithography Philipp Naujok, Kevin T. Murray, S. A. Yulin, Thin Solid Films Materials ScienceOptical MaterialsEngineeringWafer Scale ProcessingBeam Lithography	2017	12
Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber Devesh Thakare, Meiyi Wu, Karl Opsomer, Journal of Micro/Nanopatterning Materials and Metrology	2023	12
Interface characterization in B-based multilayer mirrors for next generation lithography Philipp Naujok, Sergiy Yulin, Robert Müller, Thin Solid Films	2016	10

Page 1