Satish D. Athavale - Concepedia

Author

Satish D. Athavale

Also Known As

S. Athavale, S. D. Athavale, S.D. Athavale, Satish D. Athavale

Publications

566

Citations

H-Index

Concepts

All Affiliations

Satish D. Athavale is an author at University of Houston specializing in engineering, surface science, and applied physics.

#	Concept	H-Index	Publications	Citations
1	Engineering	5	5	540
2	Applied Physics	5	5	540
3	Materials Engineering	2	2	343
4	Chemistry	1	1	37
5	Electrical Engineering	1	1	197

Satish D. Athavale

Publications

540

Citations

H-Index

Page 1

	Year	Citations
(Ba,Sr)TiO<sub>3</sub> dielectrics for future stacked- capacitor DRAM David E. Kotecki, J. D. Baniecki, Haibo Shen, IBM Journal of Research and Development EngineeringEmerging Memory TechnologyThin Film Process TechnologyFerroelectric ApplicationSuperconductivity	1999	197
Realization of atomic layer etching of silicon Satish D. Athavale, Demetre J. Economou Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceMaterials EngineeringSingle Crystal SiliconEngineeringMicrofabrication	1996	146
Molecular dynamics simulation of atomic layer etching of silicon Satish D. Athavale, Demetre J. Economou Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Ps Time ScaleEngineeringMolecular Dynamics SimulationIntegrated CircuitsSilicon On Insulator	1995	110
Chemical vapor deposition of aluminum and gallium nitride thin films from metalorganic precursors David M. Hoffman, S.P. Rangarajan, Satish D. Athavale, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceAluminium NitrideEngineeringGrowth RateSurface Science	1996	50
Plasma-enhanced chemical vapor deposition of silicon, germanium, and tin nitride thin films from metalorganic precursors David M. Hoffman, S.P. Rangarajan, Satish D. Athavale, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringMetalorganic PrecursorsOptoelectronic DevicesThin Film Process TechnologyChemistry	1995	37

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