S. Ichimura

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Active since

1999

Affiliations

National Institute of Advanced Industrial Science and Technology(Current)

S. Ichimura is an author at National Institute of Advanced Industrial Science and Technology specializing in materials science, silicon materials, and ozone.

Publications per year

1999–2007

Publications

Depth resolution improvement in secondary ion mass spectrometry analysis using metal cluster complex ion bombardment

M. Tomita, T. Kinno, M. Koike et al. · Applied Physics Letters · 2006 · 31 citations

Natural Sciences, Chemistry, Materials Science +8

Ultrathin silicon oxide film on Si(100) fabricated by highly concentrated ozone at atmospheric pressure

Ken Nakamura, S. Ichimura, Akira Kurokawa et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1999 · 26 citations

Natural Sciences, Materials Engineering, Materials Science +15

High Quality Gate Dielectric Film on Poly-Silicon Grown at Room Temperature using UV Light Excited Ozone

N. Kameda, Tetsuya Nishiguchi, Yoshiki Morikawa et al. · Journal of The Electrochemical Society · 2007 · 23 citations · Full text

Engineering, Electrical Engineering, Materials Science +15

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