Tetsuya Nishiguchi

High-quality SiO2 film formation by highly concentrated ozone gas at below 600 °C

Tetsuya Nishiguchi, Hidehiko Nonaka, Shingo Ichimura et al. · Applied Physics Letters · 2002 · 44 citations

Engineering, Atmospheric Photochemistry, Nm Sio2 Film +18

Behavior of Charge Density Waves in a One-Dimensional Organic Conductor Visualized by Scanning Tunneling Microscopy

Tetsuya Nishiguchi, Masami Kageshima, N. Ara-kato et al. · Physical Review Letters · 1998 · 33 citations

Engineering, Microscopy, Organic Electronics +22

Development of a continuous generation/supply system of highly concentrated ozone gas for low-temperature oxidation process

Shingo Ichimura, Hidehiko Nonaka, Yoshiki Morikawa et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2004 · 23 citations

Advanced Oxidation Process, Chemical Engineering, Hc Ozone Gas +11

High Quality Gate Dielectric Film on Poly-Silicon Grown at Room Temperature using UV Light Excited Ozone

N. Kameda, Tetsuya Nishiguchi, Yoshiki Morikawa et al. · Journal of The Electrochemical Society · 2007 · 23 citations · Full text

Engineering, Silicon On Insulator, Excited Ozone +16

Low-Temperature Oxidation of Silicon using UV-Light-Excited Ozone

Aki Tosaka, Tetsuya Nishiguchi, Hidehiko Nonaka et al. · Japanese Journal of Applied Physics · 2005 · 23 citations

Advanced Oxidation Process, Optical Materials, Engineering +19