Tetsuya Nishiguchi - Concepedia

Author

Tetsuya Nishiguchi

Meidensha (Japan)

Also Known As

Nishiguchi, Tetsuya, T. Nishiguchi, Tetsuya NISHIGUCHI, Tetsuya Nishiguchi

Publications

266

Citations

H-Index

Concepts

All Affiliations

Meidensha (Japan)National Institute of Advanced Industrial Science and Technology

About

Tetsuya Nishiguchi is an author at Meidensha (Japan) specializing in engineering, chemistry, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	7	7	176
2	Applied Physics	5	5	137
3	Chemical Engineering	4	4	104
4	Health Sciences	2	2	37
5	Natural Sciences	1	1	33

Tetsuya Nishiguchi

Publications

176

Citations

H-Index

Page 1

	Year	Citations
High-quality SiO2 film formation by highly concentrated ozone gas at below 600 °C Tetsuya Nishiguchi, Hidehiko Nonaka, Shingo Ichimura, Applied Physics Letters EngineeringAtmospheric PhotochemistryNm Sio2 FilmIntegrated CircuitsChemistry	2002	44
Behavior of Charge Density Waves in a One-Dimensional Organic Conductor Visualized by Scanning Tunneling Microscopy Tetsuya Nishiguchi, Masami Kageshima, N. Ara-kato, Physical Review Letters EngineeringMicroscopyOrganic ElectronicsCharge Density WavesChemistry	1998	33
Development of a continuous generation/supply system of highly concentrated ozone gas for low-temperature oxidation process Shingo Ichimura, Hidehiko Nonaka, Yoshiki Morikawa, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Advanced Oxidation ProcessChemical EngineeringHc Ozone GasEngineeringEnvironmental Engineering	2004	23
High Quality Gate Dielectric Film on Poly-Silicon Grown at Room Temperature using UV Light Excited Ozone N. Kameda, Tetsuya Nishiguchi, Yoshiki Morikawa, Journal of The Electrochemical Society EngineeringSilicon On InsulatorExcited OzoneNanoelectronicsThin Film Processing	2007	23
Low-Temperature Oxidation of Silicon using UV-Light-Excited Ozone Aki Tosaka, Tetsuya Nishiguchi, Hidehiko Nonaka, Japanese Journal of Applied Physics Advanced Oxidation ProcessOptical MaterialsEngineeringLaser ApplicationsLow-temperature Oxidation	2005	23
Reactive oxygen beam generation system using pulsed laser evaporation of highly concentrated solid ozone Tetsuya Nishiguchi, Yoshiki Morikawa, Mitsuru Kekura, Review of Scientific Instruments Advanced Oxidation ProcessOptical MaterialsEngineeringLaser-plasma InteractionLaser Applications	2002	16
Rapid Oxidation of Silicon Using UV-Light Irradiation in Low-Pressure, Highly Concentrated Ozone Gas below 300 °C Tetsuya Nishiguchi, Shigeru Saitoh, N. Kameda, Japanese Journal of Applied Physics Advanced Oxidation ProcessEngineeringAtmospheric PhotochemistryRapid OxidationLow Density	2007	14

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