Ken Nakamura

Statistics

Publications

Citations

260

H-Index

Active since

1997

Affiliations

National Institute of Advanced Industrial Science and Technology(Current)

Ken Nakamura is an author at National Institute of Advanced Industrial Science and Technology specializing in surface science, natural sciences, and materials science.

ORCID

Publications per year

1997–2009

Publications

Silicon oxidation by ozone

Christian K. Fink, Ken Nakamura, Shingo Ichimura et al. · Journal of Physics Condensed Matter · 2009 · 68 citations

Natural Sciences, Chemistry, Materials Science +17

Ultrathin SiO2 film growth on Si by highly concentrated ozone

Shingo Ichimura, Akira Kurokawa, Ken Nakamura et al. · Thin Solid Films · 2000 · 38 citations

Natural Sciences, Materials Engineering, Materials Science +12

Reduction of the interfacial Si displacement of ultrathin SiO2 on Si(100) formed by atmospheric-pressure ozone

Akira Kurokawa, Ken Nakamura, Shingo Ichimura et al. · Applied Physics Letters · 2000 · 36 citations

Natural Sciences, Materials Engineering, Materials Science +17

Comparison of initial oxidation of Si(111)7×7 with ozone and oxygen investigated by second harmonic generation

Ken Nakamura, Akira Kurokawa, Shingo Ichimura · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1997 · 28 citations

Natural Sciences, Materials Engineering, Materials Science +14

Ultrathin silicon oxide film on Si(100) fabricated by highly concentrated ozone at atmospheric pressure

Ken Nakamura, S. Ichimura, Akira Kurokawa et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1999 · 26 citations

Natural Sciences, Materials Engineering, Materials Science +15

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