Concepedia

Dae-Hong Min

DM

5

Publications

171

Citations

5

H-Index

2019

Active since

Affiliations

Kyung Hee University(Current)

Electronics and Telecommunications Research Institute

Dae-Hong Min is an author at Kyung Hee University specializing in engineering, applied physics, and electrical engineering.

Top concepts

Thin FilmsEngineeringApplied PhysicsMaterial ScienceElectrical EngineeringFerroelectric MaterialsSemiconductorsSurface ScienceFunctional MaterialsMemory Devices

Publications per year

2019–2020

5

Publications

5

Improvement in Long-Term and High-Temperature Retention Stability of Ferroelectric Field-Effect Memory Transistors With Metal–Ferroelectric–Metal–Insulator–Semiconductor Gate-Stacks Using Al-Doped HfO<sub>2</sub> Thin Films

So-Jung Yoon, Dae-Hong Min, Seung Eon Moon et al. · IEEE Transactions on Electron Devices · 2020 · 50 citations

Non-volatile Memory, Engineering, Emerging Memory Technology +16

Comparative studies on ferroelectric switching kinetics of sputtered Hf0.5Zr0.5O2 thin films with variations in film thickness and crystallinity

Tae-Hyun Ryu, Dae-Hong Min, Sung‐Min Yoon · Journal of Applied Physics · 2020 · 41 citations

Materials Science, Electrical Engineering, Engineering +12

Impact of Thickness Control of Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> Films for the Metal–Ferroelectric–Insulator–Semiconductor Capacitors

Dae-Hong Min, Seung Youl Kang, Seung Eon Moon et al. · IEEE Electron Device Letters · 2019 · 40 citations

Engineering, Metal–ferroelectric–insulator–semiconductor Capacitors, Thin Film Process Technology +16

Improvements in the synaptic operations of ferroelectric field-effect transistors using Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> thin films controlled by oxygen partial pressures during the sputtering deposition process

Dae-Hong Min, Tae-Hyun Ryu, So-Jung Yoon · Journal of Materials Chemistry C · 2020 · 29 citations

Engineering, Field-effect Transistors, Thin Film Process Technology +16

Design strategies for improvement in nonvolatile memory characteristics of metal-ferroelectric-metal-insulator-semiconductor capacitors using ferroelectric Hf <sub>0.5</sub> Zr <sub>0.5</sub> O <sub>2</sub> thin films

Dae-Hong Min, Seung Eon Moon, Sung‐Min Yoon · Journal of Physics D Applied Physics · 2019 · 11 citations

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