Andrew R. Romano - Concepedia

Author

Andrew R. Romano

SunEdison (United States)ORCID

Also Known As

A ROMANO, A. Romano, Andrew R. Romano, Andrew Romano, Romano, Andrew R.

Publications

267

Citations

H-Index

Concepts

All Affiliations

SunEdison (United States)Clariant (United States)University of Toronto The University of Texas at Austin

About

Andrew R. Romano is an author at SunEdison (United States) specializing in engineering, materials science, and surface science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	9	9	162
2	Applied Physics	6	6	101
3	Chemical Engineering	3	3	49
4	Business	1	1	36
5	Health Sciences	1	1	20

Andrew R. Romano

Publications

162

Citations

H-Index

Page 1

	Year	Citations
Dynamic Nash Equilibrium Seeking for Higher-Order Integrators in Networks Andrew R. Romano, Lacra Pavel Mathematical ProgrammingEngineeringNetworked ControlGame TheoryAutonomous Agent System	2019	36
193 nm Immersion Lithography-Taking the Plunge Ralph R. Dammel, F. M. Houlihan, Raj Sakamuri, Journal of Photopolymer Science and Technology Optical MaterialsEngineeringElectron-beam LithographyMicroscopyFuture Outlook	2004	30
Understanding the photoresist surface-liquid interface for ArF immersion lithography Will Conley, Robert J. LeSuer, Frank F. Fan, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyChemistrySmall Molecule ComponentsChemical Engineering	2005	20
Resist component leaching in 193-nm immersion lithography Ralph R. Dammel, Georg Pawlowski, Andrew R. Romano, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Ionic PagsEngineeringElectron-beam Lithography193-Nm Immersion LithographyLeaching	2005	15
Leaching Phenomena and their Suppresion in 193 nm Immersion Lithography Ralph R. Dammel, Georg Pawlowski, Andrew R. Romano, Journal of Photopolymer Science and Technology Ionic PagsEngineeringElectron-beam LithographyLeachingFouling	2005	14
Dynamic Gradient Play for NE Seeking with Disturbance Rejection Andrew R. Romano, Lacra Pavel Artificial IntelligenceDifferential GameEngineeringMachine LearningStochastic Game	2018	13
New Resin Systems for 157nm Lithography. Ralph R. Dammel, Raj Sakamuri, Takanori Kudo, Journal of Photopolymer Science and Technology Materials SciencePolymer MaterialEngineeringElectron-beam LithographyBeam Lithography	2001	12
Dissolution Inhibitors for 157 nm Lithography: A Progress Report. Will Conley, Daniel A. Miller, Charles R. Chambers, Journal of Photopolymer Science and Technology Transparent Dissolution InhibitorsEngineeringChemistryMolecular PolymerPolymers	2002	11
193nm dual layer organic BARCs for high NA immersion lithography David J. Abdallah, Mark Neisser, Ralph R. Dammel, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Dual LayerOptical MaterialsEngineeringElectron-beam LithographyMicroscopy	2005	11

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