Journal of Photopolymer Science and Technology · 2004 · 30 citations · 8 references
Natural SciencesMaterials EngineeringMaterials ScienceOptical MaterialsPhotonicsSurface ScienceCoating TechnologyCoatingsNanostructured SurfacesOptical Thin FilmsSurface CoatingsSurface ModificationBarrier LayersDevice FabricationExtreme Ultraviolet LithographyImmersion LithographyOptical Lithography
This paper reviews the current status and future outlook of materials for 193 nm immersion lithography, with special focus on top barrier layers, photoresists, bottom antireflective coatings for numerical apertures exceeding unity, and future challenges for imaging materials along the Roadmap.
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Lovejeet Singh, Peter J. Ludovice, Clifford L. Henderson · Thin Solid Films · 2003 · 131 citations
Natural Sciences, Materials Engineering, Materials Science +17