A. Goullet

A comparative study of oxygen/organosilicon plasmas and thin SiOxCyHz films deposited in a helicon reactor

K. Aumaille, C. Vallée, A. Granier et al. · Thin Solid Films · 2000 · 131 citations

Chemical Engineering, Engineering, Applied Physics +8

Diagnostics in helicon plasmas for deposition

A. Granier, F. Nicolazo, C. Vallée et al. · Plasma Sources Science and Technology · 1997 · 95 citations

Helicon Plasmas, Chemical Engineering, Engineering +15

Impedance and electric modulus study of amorphous TiTaO thin films: highlight of the interphase effect

Ahlem Rouahi, A. Kahouli, Fatiha Challali et al. · Journal of Physics D Applied Physics · 2013 · 85 citations

Inorganic to organic crossover in thin films deposited from O2/TEOS plasmas

C. Vallée, A. Goullet, A. Granier et al. · Journal of Non-Crystalline Solids · 2000 · 62 citations

Materials Science, Engineering, O2/teos Plasmas +5

Characterization of silicon dioxide films deposited at low pressure and temperature in a helicon diffusion reactor

Christine Charles, G. Giroult-Matlakowski, R. W. Boswell et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1993 · 59 citations

Materials Science, Semiconductors, Helicon Diffusion Reactor +13