K. Aumaille

A comparative study of oxygen/organosilicon plasmas and thin SiOxCyHz films deposited in a helicon reactor

K. Aumaille, C. Vallée, A. Granier et al. · Thin Solid Films · 2000 · 131 citations

Chemical Engineering, Engineering, Applied Physics +8

Optical emission spectra of TEOS and HMDSO derived plasmas used for thin film deposition

A. Granier, M. Vervloët, K. Aumaille et al. · Plasma Sources Science and Technology · 2003 · 78 citations · Full text

Study of oxygen/tetraethoxysilane plasmas in a helicon reactor using optical emission spectroscopy and mass spectrometry

K. Aumaille, A. Granier, Martin Schmidt et al. · Plasma Sources Science and Technology · 2000 · 26 citations

Engineering, Atomic Emission Spectroscopy, Helicon Reactor +16

Structure and properties of silicon oxide films deposited in a dual microwave-rf plasma reactor

N Benissad, K. Aumaille, A. Granier et al. · Thin Solid Films · 2001 · 25 citations · Full text

Experimental investigation of the respective roles of oxygen atoms and electrons in the deposition of SiO2 in O2/TEOS helicon plasmas

A. Granier, C. Vallée, A. Goullet et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1999 · 21 citations

Engineering, Vacuum Device, Chemistry +18