Publication | Closed Access
A comparative study of oxygen/organosilicon plasmas and thin SiOxCyHz films deposited in a helicon reactor
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Citations
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References
2000
Year
Chemical EngineeringEngineeringApplied PhysicsThin Sioxcyhz FilmsChemistryGas Discharge PlasmaNonthermal PlasmaOxygen/organosilicon PlasmasComparative StudyPlasma ProcessingPlasma Application
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