J. Finster - Concepedia

Author

J. Finster

Leipzig University

Also Known As

J Finster, J. FINSTER, J. Finster, JOACHIM FINSTER, Joachim Finster

Publications

981

Citations

H-Index

Concepts

All Affiliations

Leipzig University University of Rostock Fritz Haber Institute of the Max Planck Society

About

J. Finster is an author at Leipzig University specializing in engineering, applied physics, and surface science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	15	16	745
2	Applied Physics	12	12	512
3	Chemistry	8	8	314
4	Chemical Engineering	6	6	295
5	Natural Sciences	3	3	93

J. Finster

Publications

898

Citations

H-Index

Page 1

	Year	Citations
Esca investigations of some NiO/SiO2 and NiO—Al2 O3 /SiO2 catalysts Petra Lorenz, J. Finster, G. Wendt, Journal of Electron Spectroscopy and Related Phenomena Materials ScienceInorganic ChemistryMaterials EngineeringChemical EngineeringOxide Heterostructures	1979	137
ESCA and SEXAFS investigations of insulating materials for ULSI microelectronics J. Finster, Ernst‐Dieter Klinkenberg, Jan Heeg, Vacuum Materials EngineeringMaterials ScienceElectromigration TechniqueSexafs InvestigationsEngineering	1990	97
Interpretation of XPS core level shifts and structure of thin silicon oxide layers J. Finster, Dietmar Schulze, F. Bechstedt, Surface Science Materials EngineeringEngineeringPhysicsNanoelectronicsOxide Electronics	1985	79
SiO <sub>2</sub> in 6:3 (stishovite) and 4:2 Co‐ordination—Characterization by core level spectroscopy (XPS/XAES) J. Finster Surface and Interface Analysis	1988	67
Oxidation of etched silicon in air at room temperature; Measurements with ultrasoft X-ray photoelectron spectroscopy (ESCA) and neutron activation analysis G. Mende, J. Finster, Daniel Flamm, Surface Science Materials ScienceRoom TemperatureEngineeringEtched SiliconOxidation Resistance	1983	54
Oxidation of etched silicon in air at room temperature; Measurements with ultrasoft X-ray photoelectron spectroscopy (ESCA) and neutron activation analysis G. Mende, J. Finster, Daniel Flamm, Surface Science Materials ScienceRoom TemperatureEngineeringEtched SiliconOxidation Resistance	1983	52
Characterization of amorphous SiOx layers with ESCA J. Finster, Dietmar Schulze, A. Meisel Surface Science Materials ScienceEngineeringSurface ScienceApplied PhysicsSemiconductor Material	1985	50
Orientation and temperature dependence of H2S adsorption on cylindrical Ge and GaAs samples H.J. Kuhr, W. Ranke, J. Finster Surface Science Ii-vi SemiconductorChemical EngineeringEngineeringSurface ScienceApplied Physics	1986	43
SW Xα calculations and x-ray photoelectron spectra of molybdenum(II) chloride cluster compounds Gotthard Seifert, J. Finster, H. W. Müller Chemical Physics Letters Transition Metal ChalcogenidesInorganic ChemistryChemical EngineeringEngineeringX-ray Photoelectron Spectra	1980	41
Studies of the Si/SiO2 interface by angular dependent X-ray photoelectron spectroscopy J. Finster, Dietmar Schulze physica status solidi (a)	1981	40

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