Orlando Escorcia

The effect of Ta on the magnetic thickness of permalloy (Ni81Fe19) films

M. Kowalewski, W. H. Butler, Nassrin Moghadam et al. · Journal of Applied Physics · 2000 · 73 citations

Materials Science, Materials Engineering, Magnetism +15

Thin film processing by biased target ion beam deposition

T. L. Hylton, B. Ciorneiu, D. A. Baldwin et al. · IEEE Transactions on Magnetics · 2000 · 38 citations

Materials Science, Materials Engineering, Electrical Engineering +15

Cleaning Solutions for p-MSQ Low-k Device Applications

Carlo Waldfried, Orlando Escorcia, Qing Han et al. · Electrochemical and Solid-State Letters · 2003 · 24 citations

Materials Science, Chemical Engineering, Wafer Scale Processing +15

Damage of Low-k and Ultralow-k Dielectrics from Reductive Plasma Discharges Used for Photoresist Removal

Darren L. Moore, Richard J. Carter, Hao Cui et al. · Journal of The Electrochemical Society · 2005 · 23 citations

Engineering, Glow Discharge, Ultralow-k Dielectrics +18

Plasma Impacts to an O-SiC Low-k Barrier Film

Wei Chen, Qingyuan Han, Robert Most et al. · Journal of The Electrochemical Society · 2004 · 16 citations

Materials Science, Electrical Engineering, Dielectric Constant +9