O. K. Porada

Characterization of SiCN thin films: Experimental and theoretical investigations

A.O. Kozak, O. K. Porada, L. A. Ivashchenko et al. · Thin Solid Films · 2014 · 55 citations

Materials Science, Engineering, Applied Physics +4

Structural, optoelectronic and mechanical properties of PECVD Si-C-N films: An effect of substrate bias

A.O. Kozak, O. K. Porada, L. A. Ivashchenko et al. · Materials Science in Semiconductor Processing · 2018 · 34 citations

Materials Science, Optical Materials, Engineering +10

a-SiC:H films as perspective wear-resistant coatings

O. K. Porada, L. A. Ivashchenko, G. V. Rusakov et al. · Surface and Coatings Technology · 2004 · 33 citations

Materials Engineering, Materials Science, Engineering +4

Comparative investigation of Si-C-N Films prepared by plasma enhanced chemical vapour deposition and magnetron sputtering

A.O. Kozak, O. K. Porada, L. A. Ivashchenko et al. · Applied Surface Science · 2017 · 33 citations

Materials Science, Materials Engineering, Si-c-n Films +12

Characteristics of thin plasmachemical silicon carbon nitride films deposited using hexamethyldisilane

O. K. Porada, L. A. Ivashchenko, I. I. Timofeeva et al. · Powder Metallurgy and Metal Ceramics · 2009 · 17 citations

Materials Science, Engineering, Applied Physics +5