O. K. Porada - Concepedia

Author

O. K. Porada

Frantsevich Institute for Problems in Materials Science

Also Known As

O PORADA, O. K. Porada, O. K. Porada, O.K. Porada, Oleksandr Porada

Publications

274

Citations

H-Index

Concepts

All Affiliations

Frantsevich Institute for Problems in Materials Science Institute of Physics V.E. Lashkaryov Institute of Semiconductor Physics

About

O. K. Porada is an author at Frantsevich Institute for Problems in Materials Science specializing in materials science, engineering, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	8	8	214
2	Materials Science	8	8	214
3	Applied Physics	7	7	181
4	Materials Engineering	4	4	95
5	Mechanical Engineering	1	1	14

O. K. Porada

Publications

214

Citations

H-Index

Page 1

	Year	Citations
Characterization of SiCN thin films: Experimental and theoretical investigations A.O. Kozak, O. K. Porada, L. A. Ivashchenko, Thin Solid Films Materials ScienceEngineeringApplied PhysicsSicn Thin FilmsThin Films	2014	55
Structural, optoelectronic and mechanical properties of PECVD Si-C-N films: An effect of substrate bias A.O. Kozak, O. K. Porada, L. A. Ivashchenko, Materials Science in Semiconductor Processing Materials ScienceOptical MaterialsEngineeringMechanical PropertiesSubstrate Bias	2018	34
a-SiC:H films as perspective wear-resistant coatings O. K. Porada, L. A. Ivashchenko, G. V. Rusakov, Surface and Coatings Technology Materials EngineeringMaterials ScienceEngineeringSurface ScienceH Films	2004	33
Comparative investigation of Si-C-N Films prepared by plasma enhanced chemical vapour deposition and magnetron sputtering A.O. Kozak, O. K. Porada, L. A. Ivashchenko, Applied Surface Science Materials ScienceMaterials EngineeringSi-c-n FilmsEngineeringNanoelectronics	2017	33
Characteristics of thin plasmachemical silicon carbon nitride films deposited using hexamethyldisilane O. K. Porada, L. A. Ivashchenko, I. I. Timofeeva, Powder Metallurgy and Metal Ceramics Materials ScienceEngineeringApplied PhysicsThin FilmsChemical Vapor Deposition	2009	17
An effect of hydrogenation on the photoemission of amorphous SiCN films O. K. Porada, A.O. Kozak, V.S. Manzhara, International Journal of Hydrogen Energy Materials EngineeringMaterials ScienceEngineeringAmorphous Sicn FilmsApplied Physics	2021	15
Mechanical properties of PECVD a-SiC:H thin films prepared from methyltrichlorosilane S. N. Dub, O. K. Porada, L. A. Ivashchenko, Surface and Coatings Technology Materials EngineeringMaterials ScienceEngineeringMechanical EngineeringApplied Physics	2006	14
Optoelectronic properties and carrier transport mechanisms in amorphous SiCN V.V. Tetyorkin, А. І. Ткачук, O. K. Porada, Journal of Non-Crystalline Solids Materials ScienceEngineeringOptoelectronic PropertiesOptoelectronic MaterialsApplied Physics	2019	13

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