A. R. Shimkunas

Advanced electron cyclotron resonance chemical vapor deposition SiC coatings and x-ray mask membranes

A. R. Shimkunas, P. E. Mauger, L. Bourget et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1991 · 26 citations

Engineering, X-ray Lithography Masks, Thin Film Process Technology +17

Observation of quantum interference effect in solids

A. Tavkhelidze, Amiran Bibilashvili, Larissa Jangidze et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2006 · 15 citations · Full text

Engineering, Thin Film Process Technology, Quantum Interference Effect +16

Radiation damage in boron nitride x-ray lithography masks

Paul L. King, Lawrence S. Pan, P. Pianetta et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1988 · 14 citations

Optical Materials, Engineering, Thin Film Process Technology +18

Silicon stencil masks for lithography below 0.25 μm by ion-projection exposure

P. E. Mauger, A. R. Shimkunas, J. C. Wolfe et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1992 · 13 citations

Engineering, Electron-beam Lithography, Microscopy +19