Correlation between the hyperfine coupling constants of donor nitrogens and the structures of the first coordination sphere in copper complexes as studied by nitrogen-14 ENDOR spectroscopy

Masamoto Iwaizumi, Takanori Kudo, Shouichi Kita

Inorganic Chemistry

EngineeringTheoretical Inorganic ChemistryAltmetric Attention ScoreOrganic ChemistryChemistry +16

Photodecomposable bases. A novel concept to stabilize chemically amplified resists.

Satoru Funato, Yohei Kinoshita, Takanori Kudo, +6

Journal of Photopolymer Science and Technology

Materials ScienceMedicinal ChemistrySupramolecular PhotochemistryEngineeringDelay Time Stability +13

Polymer Optimization of Pigmented Photoresists for Color Filter Production

Takanori Kudo, Yuki Nanjo, Yuko Nozaki, +3

Japanese Journal of Applied Physics

Optical MaterialsEngineeringResponsive PolymersMolecular WeightsChemistry +20

Progress in Spin-on Hard Mask Materials for Advanced Lithography

Munirathna Padmanaban, JoonYeon Cho, Takanori Kudo, +9

Journal of Photopolymer Science and Technology

Materials ScienceSpintronicsEngineeringElectron-beam LithographyFlexible Electronics +11

Pigmented Photoresists for Color Filters.

Takanori Kudo, Yuki Nanjo, Yuko Nozaki, +4

Journal of Photopolymer Science and Technology

Optical MaterialsEngineeringSmart PolymerGreen ChemistryChemistry +18

CD changes of 193-nm resists during SEM measurement

Takanori Kudo, Jun-Bom Bae, Ralph R. Dammel, +5

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyMeasurementEducationCd Linewidth Change +14

Bottom Anti-Reflective Coatings for DUV Lithography.

Wenbing Kang, Hatsuyuki Tanaka, Ken Kimura, +6

Journal of Photopolymer Science and Technology

EngineeringDuv LithographyBarc MaterialsBarc PolymersOptical Properties +15

New Resin Systems for 157nm Lithography.

Ralph R. Dammel, Raj Sakamuri, Takanori Kudo, +6

Journal of Photopolymer Science and Technology

Materials SciencePolymer MaterialEngineeringElectron-beam LithographyBeam Lithography +12

193 nm Resists for Deep Sub-Wavelength Applicatios.

Ralph R. Dammel, Michelle M. Cook, Axel Klauck-Jacobs, +5

Journal of Photopolymer Science and Technology

Optical MaterialsDeep Sub-wavelength ApplicatiosEngineeringElectron-beam LithographyChemistry +19

Embedded Co nanostructures on Au(001) substrate studied by scanning tunneling microscopy

Takeshi Kawagoe, Toshio Miyamachi, M. Someta, +2

Surface Science

Materials ScienceEngineeringTunneling MicroscopyNanomaterialsNanotechnology +5