Concepedia

T. Nishimiya

TN

7

Publications

271

Citations

7

H-Index

1996

Active since

Affiliations

Tokyo Institute of Technology(Current)

T. Nishimiya is an author at Tokyo Institute of Technology specializing in applied physics, engineering, and materials science.

Top concepts

EngineeringApplied PhysicsMaterial ScienceSurface ScienceMicrofabricationMicrostructureOptoelectronicsOptical PropertiesElectrical EngineeringPhysics

Publications per year

1996–2007

7

Publications

7

Hydrogenated microcrystalline silicon germanium: A bottom cell material for amorphous silicon-based tandem solar cells

G. Ganguly, T. Ikeda, T. Nishimiya et al. · Applied Physics Letters · 1996 · 93 citations · Full text

Engineering, Optical Absorption, Silicon On Insulator +17

Role of the hydrogen plasma treatment in layer-by-layer deposition of microcrystalline silicon

K. Saitoh, Michio Kondo, Makoto Fukawa et al. · Applied Physics Letters · 1997 · 64 citations

Materials Science, Chemical Engineering, Hydrogen Plasma Treatments +14

Morphological study of kinetic roughening on amorphous and microcrystalline silicon surface

Michio Kondo, Takahiro Ohe, Koji Saito et al. · Journal of Non-Crystalline Solids · 1998 · 43 citations

Materials Science, Engineering, Microfabrication +9

Light induced phenomena in microcrystalline silicon

Michio Kondo, T. Nishimiya, Katsuhiko Saito et al. · Journal of Non-Crystalline Solids · 1998 · 26 citations

Photonics, Photoluminescence, Engineering +7

Large area VHF plasma production by a balanced power feeding method

T. Nishimiya, Yoshinori Takeuchi, Yasuhiro Yamauchi et al. · Thin Solid Films · 2007 · 25 citations

Plasma Application, Electrical Engineering, Nonthermal Plasma

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