Shinya Kaneko

Characterization and optimization of porogen-based PECVD deposited extreme low-k materials as a function of UV-cure time

Patrick Verdonck, David De Roest, Shinya Kaneko et al. · Surface and Coatings Technology · 2007 · 51 citations

Materials Science, Materials Engineering, Engineering +7

A robust k∼2.3 SiCOH low-k film formed by porogen removal with UV-cure

Nathan Kemeling, Kiyohiro Matsushita, Naoto Tsuji et al. · Microelectronic Engineering · 2007 · 30 citations

Materials Engineering, Materials Science, Chemical Engineering +7

Preparation of transparent and conductive thin films of metallic single-walled carbon nanotubes

Yutaka Maeda, Masahiro Hashimoto, Shinya Kaneko et al. · Journal of Materials Chemistry · 2008 · 24 citations

Materials Science, Graphene Nanomeshes, Simple Preparation +11

Spectroscopic ellipsometry and ellipsometric porosimetry studies of CVD low‐k dielectric films

P. Maršík, P. Verdonck, Dieter Schneider et al. · Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics · 2008 · 12 citations

Optical Materials, Engineering, Nanoporous Material +21