Concepedia

Author

M. Haverlag

Eindhoven University of Technology

Also Known As

Haverlag, M Marco, Haverlag, M., M Haverlag, M. Haverlag, Marco Haverlag

125

Publications

1.6K

Citations

22

H-Index

59

Concepts

All Affiliations

Eindhoven University of TechnologyPhilips (Netherlands)IBM Research - Thomas J. Watson Research Center
MH

About

M. Haverlag is an author at Eindhoven University of Technology specializing in engineering, applied physics, and physics.

Top Concepts

#ConceptH-IndexPublicationsCitations

1

Engineering

19

33

1.1K

2

Applied Physics

15

22

800

3

Natural Sciences

11

12

620

4

Health Sciences

1

1

12

5

Chemical Engineering

1

1

23

M. Haverlag

×

45

Publications

1.4K

Citations

22

H-Index

YearCitations

Fluorocarbon high-density plasmas. I. Fluorocarbon film deposition and etching using CF4 and CHF3

G. S. Oehrlein, Y. Zhang, D. Vender,

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

1994

186

Measurements of negative ion densities in 13.56-MHz rf plasmas of CF4, C2F6, CHF3, and C3F8 using microwave resonance and the photodetachment effect

M. Haverlag, A. Kono, D. Passchier,

Journal of Applied Physics

1991

98

Production and destruction of CF<i>x</i> radicals in radio-frequency fluorocarbon plasmas

M. Haverlag, W. W. Stoffels, E. Stoffels,

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

1996

82

Temporal behavior of the electron and negative ion densities in a pulsed radio-frequency CF4 plasma

A. Kono, M. Haverlag, G. M. W. Kroesen,

Journal of Applied Physics

1991

80

Measurements of radical densities in radio-frequency fluorocarbon plasmas using infrared absorption spectroscopy

M. Haverlag, E. Stoffels, W. W. Stoffels,

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

1994

69

Speed of streamers in argon over a flat surface of a dielectric

Ana Sobota, Alexandre Lebouvier, Nicolaas J. Kramer,

Journal of Physics D Applied Physics

2008

64

Measurement of the gas temperature in fluorocarbon radio frequency discharges using infrared absorption spectroscopy

M. Haverlag, E. Stoffels, W. W. Stoffels,

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

1996

47

Sidewall passivation during the etching of poly-Si in an electron cyclotron resonance plasma of HBr

M. Haverlag, G. S. Oehrlein, D. Vender

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

1994

43

Negative Ions in Low Pressure Discharges

E. Stoffels, W. W. Stoffels, D. Vender,

Contributions to Plasma Physics

1995

39

Negative ions in a radio-frequency plasma in CF<sub>4</sub>

J. L. Jauberteau, G. J. Meeusen, M. Haverlag,

Journal of Physics D Applied Physics

1991

34

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