M. Haverlag

Fluorocarbon high-density plasmas. I. Fluorocarbon film deposition and etching using CF4 and CHF3

G. S. Oehrlein, Y. Zhang, D. Vender et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1994 · 186 citations

Engineering, Plasma Physics, Chemistry +18

Measurements of negative ion densities in 13.56-MHz rf plasmas of CF4, C2F6, CHF3, and C3F8 using microwave resonance and the photodetachment effect

M. Haverlag, A. Kono, D. Passchier et al. · Journal of Applied Physics · 1991 · 98 citations · Full text

Engineering, Laser-plasma Interaction, Laser Plasma Physic +19

Production and destruction of CF<i>x</i> radicals in radio-frequency fluorocarbon plasmas

M. Haverlag, W. W. Stoffels, E. Stoffels et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1996 · 82 citations · Full text

Cold Atmospheric Plasma, Radio-frequency Fluorocarbon Plasmas, Radical Emission +14

Temporal behavior of the electron and negative ion densities in a pulsed radio-frequency CF4 plasma

A. Kono, M. Haverlag, G. M. W. Kroesen et al. · Journal of Applied Physics · 1991 · 80 citations · Full text

Electron Density, Plasma Initiation Phase, Engineering +11

Measurements of radical densities in radio-frequency fluorocarbon plasmas using infrared absorption spectroscopy

M. Haverlag, E. Stoffels, W. W. Stoffels et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1994 · 69 citations

Radical Emission, Engineering, Atomic Emission Spectroscopy +18