Concepedia

Hiroaki Kosuge

HK

Statistics

Publications

4

Citations

87

H-Index

4

Active since

2006

Affiliations

Tosoh (Japan)(Current)

Tokyo Institute of Technology

Hiroaki Kosuge is an author at Tosoh (Japan) specializing in thin films, chemistry, and surface science.

Top concepts

ChemistryThin FilmsEngineeringSurface ScienceMaterial ScienceMaterials EngineeringApplied PhysicsChemical EngineeringInorganic ChemistryHydrogen

Publications per year

2006–2009

4

Publications

4

Low-Temperature Preparation of Metallic Ruthenium Films by MOCVD Using Bis(2,4-dimethylpentadienyl)ruthenium

Kazuhisa Kawano, Hiroaki Kosuge, Noriaki Oshima et al. · Electrochemical and Solid-State Letters · 2007 · 30 citations

Materials Science, Inorganic Chemistry, Materials Engineering +14

Seed Layer Free Conformal Ruthenium Film Deposition on Hole Substrates by MOCVD Using (2,4-Dimethylpentadienyl)(ethylcyclopentadienyl)ruthenium

Kazuhisa Kawano, Atsushi Nagai, Hiroaki Kosuge et al. · Electrochemical and Solid-State Letters · 2006 · 27 citations

Engineering, Chemistry, Chemical Deposition +16

Conformability of Ruthenium Dioxide Films Prepared on Substrates with Capacitor Holes by MOCVD and Modification by Annealing

Kazuhisa Kawano, Hiroaki Kosuge, Noriaki Oshima et al. · Electrochemical and Solid-State Letters · 2006 · 18 citations

Engineering, Chemistry, Chemical Deposition +18

The Effect of Precursor Ligands on the Deposition Characteristics of Ru Films by MOCVD

Kazuhisa Kawano, Hiroaki Kosuge, Noriaki Oshima et al. · Electrochemical and Solid-State Letters · 2009 · 12 citations

Engineering, Random Orientations, Chemistry +16

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