C. Van Bockstael - Concepedia

Author

C. Van Bockstael

Ghent University

Also Known As

C. Van Bockstael

Publications

310

Citations

H-Index

Concepts

All Affiliations

Ghent University KU Leuven University of Cape Town IBM (United States)IBM Research - Thomas J. Watson Research Center

About

C. Van Bockstael is an author at Ghent University specializing in applied physics, surface science, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	8	8	298
2	Applied Physics	8	8	298
3	Materials Science	8	8	298
4	Chemistry	4	4	119
5	Materials Engineering	3	3	85

C. Van Bockstael

Publications

298

Citations

H-Index

Page 1

	Year	Citations
Phase formation and thermal stability of ultrathin nickel-silicides on Si(100) K. De Keyser, C. Van Bockstael, R.L. Van Meirhaeghe, Applied Physics Letters Materials ScienceSemiconductorsElectronic DevicesEngineeringElectronic Materials	2010	83
Pt redistribution during Ni(Pt) silicide formation J. Demeulemeester, D. Smeets, C. Van Bockstael, Applied Physics Letters Materials ScienceInorganic ChemistryNisi SeedsMaterial AnalysisEngineering	2008	53
Epitaxial Formation of a Metastable Hexagonal Nickel–Silicide K. De Keyser, C. Van Bockstael, Christophe Detavernier, Electrochemical and Solid-State Letters Materials ScienceSemiconductorsEpitaxial FormationEpitaxial GrowthEngineering	2008	42
Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films C. Van Bockstael, K. De Keyser, R.L. Van Meirhaeghe, Applied Physics Letters EngineeringNm Ni FilmSemiconductor NanostructuresNisi AgglomerationEpitaxial Growth	2009	38
The influence of Pt redistribution on Ni1−xPtxSi growth properties J. Demeulemeester, D. Smeets, C.M. Comrie, Journal of Applied Physics Materials EngineeringMaterials SciencePt InterlayerMaterial AnalysisEngineering	2010	31
On the growth kinetics of Ni(Pt) silicide thin films J. Demeulemeester, Dirk Smeets, C.M. Comrie, Journal of Applied Physics Materials ScienceSilicide Thin FilmsEpitaxial GrowthEngineeringCrystalline Defects	2013	24
Effect of Pt addition on growth stress and thermal stress of NiSi films C. Van Bockstael, K. De Keyser, Davy Deduytsche, Journal of Applied Physics Pt InterlayerEngineeringCrystal Growth TechnologyGrowth StressSolidification	2008	16
<i>In situ</i> study of the formation of silicide phases in amorphous Ni–Si mixed layers C. Van Bockstael, Christophe Detavernier, R.L. Van Meirhaeghe, Journal of Applied Physics Materials ScienceSilicide PhasesEngineeringCrystalline DefectsCrystal Growth Technology	2009	11

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