Hidemasa Muta

Intensive optimization of masks and sources for 22nm lithography

Alan E. Rosenbluth, David Melville, Kehan Tian et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 30 citations

Engineering, Computer Engineering, Manufacturing Engineering +14

Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations

David Melville, Alan E. Rosenbluth, Kehan Tian et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 22 citations

Engineering, Manufacturing Engineering, Digital Fabrication +11

Conversational Bootstrapping and Other Tricks of a Concierge Robot

Shang Guo, Jonathan Lenchner, Jonathan H. Connell et al. · 2017 · 15 citations

Computing, Computer Science, Robotics Engineering +17

Manufacturability-Aware Design of Standard Cells

Hidemasa Muta, Hidetaka Onodera · IEICE Transactions on Fundamentals of Electronics Communications and Computer Sciences · 2007 · 14 citations

Engineering, Computer Engineering, Design +17

Multilevel parallelization on the cell/B.E. for a motion JPEG 2000 encoding server

Hidemasa Muta, Munehiro Doi, Hiroki Nakano et al. · 2007 · 14 citations

Computing, Computer Engineering, Computer Science +17