Chang Mo Yoon

Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al₂O₃ Nanopatterns

Seunggi Seo, Byung Chul Yeo, Sang Soo Han et al. · ACS Applied Materials & Interfaces · 2017 · 98 citations

Low-temperature, high-growth-rate ALD of SiO2 using aminodisilane precursor

Taewook Nam, Hyunho Lee, Taejin Choi et al. · Applied Surface Science · 2019 · 51 citations

Crystal Growth Technology, Surface Science, Aminodisilane Precursor +3

The Impact of an Ultrathin Y₂O₃Layer on GeO₂Passivation in Ge MOS Gate Stacks

Yujin Seo, Tae In Lee, Chang Mo Yoon et al. · IEEE Transactions on Electron Devices · 2017 · 28 citations

Semiconductor Technology, Electrical Engineering, Semiconductor Device +12

Effects of Ar Addition to O₂ Plasma on Plasma-Enhanced Atomic Layer Deposition of Oxide Thin Films

Hanearl Jung, Il‐Kwon Oh, Chang Mo Yoon et al. · ACS Applied Materials & Interfaces · 2018 · 23 citations

Very high frequency plasma reactant for atomic layer deposition

Il‐Kwon Oh, Gilsang Yoo, Chang Mo Yoon et al. · Applied Surface Science · 2016 · 20 citations · Full text

Materials Science, Engineering, Applied Physics +3