Low-temperature, high-growth-rate ALD of SiO2 using aminodisilane precursor - Concepedia

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Low-temperature, high-growth-rate ALD of SiO2 using aminodisilane precursor

51

Citations

63

References

2019

Year

Taewook Nam, Hyunho Lee, Taejin Choi, Seunggi Seo, Chang Mo Yoon, Yunjung Choi, Heonjong Jeong, Hima K. Lingam, Venkateswara Rao Chitturi, Jong‐Hyun Ahn,

Applied Surface Science

Crystal Growth TechnologySurface ScienceAminodisilane PrecursorCalcium AluminateChemistryChemical Vapor Deposition

References

	Year	Citations

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