H. Walde

Aspects and results of long-term stable deposition of Al2O3 with high rate pulsed reactive magnetron sputtering

Peter Frach, U. Heisig, Chr. Gottfried et al. · Surface and Coatings Technology · 1993 · 61 citations

Materials Engineering, Materials Science, Aluminium Nitride +9

Fast imaging of transient electron injection in planar magnetron discharges

F. G. Tomasel, Don Carter, H. Walde et al. · Plasma Sources Science and Technology · 2003 · 17 citations

Engineering, Fast Imaging, Glow Discharge +16

Pulsed-DC Reactive Sputtering of Dielectrics: Pulsing Parameter Effects

A. Belkind, Zhenqian Zhao, D. Carter et al. · 2000 · 13 citations

Electrical Engineering, Engineering, Dc Power +10

Managing arcs in large area sputtering applications

D. Carter, H. Walde, K. Nauman · Thin Solid Films · 2011 · 12 citations

Cluster Computing, Engineering, In-storage Computing +7

Parameter Optimization in Pulsed DC Reactive Sputter Deposition of Aluminum Oxide

D. Carter, H. Walde, G. McDonough et al. · 2002 · 10 citations