Motoki Kadowaki

Performance of EBeyeM for EUV mask inspection

Shinji Yamaguchi, Masato Naka, Takashi Hirano et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 29 citations

Engineering, Inspection, Electron-beam Lithography +19

Contrast reversal effect in scanning electron microscopy due to charging

H. Abe, S. Babin, S. S. Borisov et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2009 · 27 citations

Electrical Engineering, Engineering, Critical Dimension +14

Development of EB inspection system EBeyeM for EUV mask

Takashi Hirano, Shinji Yamaguchi, Masato Naka et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 18 citations

Engineering, Inspection, Electron-beam Lithography +20

Investigation of factors causing difference between simulation and real SEM image

Motoki Kadowaki, A. Hamaguchi, Hideki Abe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 14 citations

Geophysics, Surface Characterization, Engineering +13

Experiment and simulation of charging effects in SEM

S. Babin, S. S. Borisov, Yumiko Miyano et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 13 citations

Electrohydrodynamics, Engineering, Electron-beam Lithography +20