Kenji Nakashima

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Publications

Citations

151

H-Index

Active since

1991

Affiliations

Toyota Central Research and Development Laboratories (Japan)(Current)

Kenji Nakashima is an author at Toyota Central Research and Development Laboratories (Japan) specializing in materials science, materials engineering, and semiconductor surfaces.

ORCID

Publications per year

1991–2017

Publications

Properties of silicon surface cleaned by hydrogen plasma

Masahiko Ishii, Kenji Nakashima, Ichiro Tajima et al. · Applied Physics Letters · 1991 · 44 citations

Natural Sciences, Materials Engineering, Materials Science +17

Investigation of Hydrogen Plasma Etched Si Surfaces

Masahiko Ishii, Kenji Nakashima, Ichiro Tajima et al. · Japanese Journal of Applied Physics · 1992 · 30 citations

Natural Sciences, Materials Engineering, Materials Science +17

Existence of threshold density in silicon surface cleaning using hydrogen electron cyclotron resonance plasma

Kenji Nakashima, Masahiko Ishii, Ichiro Tajima et al. · Applied Physics Letters · 1991 · 21 citations

Natural Sciences, Materials Science, Physics +17

Effects of substrate temperature and bias potential on hydrogen plasma etching of silicon

Masahiko Ishii, Kenji Nakashima, Tetsuo Hayakawa et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 15 citations

Engineering, Materials Engineering, Materials Science +17

TaC-coated graphite prepared via a wet ceramic process: Application to CVD susceptors for epitaxial growth of wide-bandgap semiconductors

Daisuke Nakamura, Taishi Kimura, Tetsuo Narita et al. · Journal of Crystal Growth · 2017 · 15 citations

Engineering, Materials Engineering, Materials Science +11

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