Tetsuo Hayakawa

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Active since

1994

Affiliations

Toyota Central Research and Development Laboratories (Japan)(Current)

Tetsuo Hayakawa is an author at Toyota Central Research and Development Laboratories (Japan) specializing in etching processes, electronic materials, and materials science.

Publications per year

1994–1998

Publications

Effects of substrate temperature and bias potential on hydrogen plasma etching of silicon

Masahiko Ishii, Kenji Nakashima, Tetsuo Hayakawa et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 15 citations

Engineering, Materials Engineering, Materials Science +17

Mechanism of Residue Formation in Silicon Trench Etching Using a Bromine-Based Plasma

Tetsuo Hayakawa, Takashi Suzuki, Tsutomu Uesugi et al. · Japanese Journal of Applied Physics · 1998 · 13 citations

Engineering, Materials Engineering, Materials Science +17

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