Concepedia
Statistics
Publications
41
Citations
868
H-Index
19
Active since
1991
Affiliations
Tohoku University(Current)
Systems Research Institute
Spintronics Research Network of Japan
Institut für Solartechnologien (Germany)
Physical Devices (United States)
Masao Sakuraba is an author at Tohoku University specializing in engineering, applied physics, and surface science.
Top concepts
Applied PhysicsEngineeringSurface ScienceMaterial ScienceElectrical EngineeringPhysicsChemistrySurface ChemistryMaterials EngineeringThin Films
Publications per year
1991–2018
Atomically Controlled Processing for Group IV Semiconductors by Chemical Vapor Deposition
Junichi Murota, Masao Sakuraba, Bernd Tillack · Japanese Journal of Applied Physics · 2006 · 84 citations · Full text
Materials Science, Semiconductors, Ii-vi Semiconductor +13
Silicon atomic layer growth controlled by flash heating in chemical vapor deposition using SiH4 gas
Junichi Murota, Masao Sakuraba, Shoichi Ono · Applied Physics Letters · 1993 · 43 citations
Engineering, Sih4 Gas, Chemistry +17
Atomically controlled processing for group IV semiconductors
Junichi Murota, Takashi Matsuura, Masao Sakuraba · Surface and Interface Analysis · 2002 · 41 citations · Full text
Semiconductors, Ii-vi Semiconductor, Engineering +15
Stability of the dimer structure formed on Si(100) by ultraclean low-pressure chemical-vapor deposition
Masao Sakuraba, Junichi Murota, Shoichi Ono · Journal of Applied Physics · 1994 · 39 citations
Materials Science, Chemical Engineering, Engineering +13
Atomic‐Order Thermal Nitridation of Silicon at Low Temperatures
Takeshi Watanabe, Akihiro Ichikawa, Masao Sakuraba et al. · Journal of The Electrochemical Society · 1998 · 35 citations
Atomic‐order Nitridation, Engineering, Surface Chemistry +12
Rows per page
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