Daniel J. Kester - Concepedia

Author

Daniel J. Kester

Pennsylvania State University

Also Known As

D. J. Kester, D.J. Kester, Daniel J. Kester

Publications

946

Citations

H-Index

Concepts

All Affiliations

Pennsylvania State University North Carolina State University

About

Daniel J. Kester is an author at Pennsylvania State University specializing in applied physics, engineering, and thin films.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	9	9	928
2	Applied Physics	9	9	928
3	Materials Science	7	7	712
4	Materials Engineering	2	2	108
5	Physics	2	2	498

Daniel J. Kester

Publications

941

Citations

H-Index

Page 1

	Year	Citations
Phase control of cubic boron nitride thin films Daniel J. Kester, R. Messier Journal of Applied Physics Materials ScienceCubic BoronBoron NitrideEngineeringPhysics	1992	352
Phase evolution in boron nitride thin films Daniel J. Kester, K. S. Ailey, R. F. Davis, Journal of materials research/Pratt's guide to venture capital sources Boron NitrideEngineeringHexagonal Boron NitrideApplied PhysicsCondensed Matter Physics	1993	194
Growth and characterization of cubic boron nitride thin films Daniel J. Kester, K. S. Ailey, Daniel J. Lichtenwalner, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceCubic BoronBoron NitrideEngineeringCrystalline Defects	1994	146
Deposition and characterization of boron nitride thin films Daniel J. Kester, K. S. Ailey, R. F. Davis Diamond and Related Materials Materials ScienceBoron NitrideEngineeringHexagonal Boron NitrideApplied Physics	1994	74
Macro-effects of resputtering due to negative ion bombardment of growing thin films Daniel J. Kester, R. Messier Journal of materials research/Pratt's guide to venture capital sources Materials ScienceMaterials EngineeringIon ImplantationEngineeringMicrofabrication	1993	58
Predicting negative ion resputtering in thin films Daniel J. Kester, R. Messier Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceMaterials EngineeringSurface TechnologyIon ImplantationEngineering	1986	50
Gas-source molecular beam epitaxy of III–V nitrides R. F. Davis, Michael J. Paisley, Zlatko Sitar, Journal of Crystal Growth EngineeringApplied PhysicsOptoelectronic DevicesMolecular Beam EpitaxyCategoryiii-v Semiconductor	1997	22
Micro-effects of resputtering due to negative ion bombardment of growing thin films Daniel J. Kester, R. Messier Journal of materials research/Pratt's guide to venture capital sources Materials ScienceIon ImplantationEngineeringMicrofabricationSurface Science	1993	20
Deposition of III-N thin films by molecular beam epitaxy R. F. Davis, Michael J. Paisley, Zlatko Sitar, Microelectronics Journal	1994	13
Ion Beam Assisted Deposition of Cubic Boron Nitride Thin Films Daniel J. Kester, R. Messier MRS Proceedings Materials ScienceBoron NitrideEngineeringHexagonal Boron NitrideCubic Boron Nitride	1991	12

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