F. Fenske

Statistics

Publications

Citations

650

H-Index

Active since

1989

Affiliations

Fraunhofer Institute for Telecommunications, Heinrich Hertz Institute(Current)

Helmholtz-Zentrum Berlin für Materialien und Energie

Fraunhofer Institute for Surface Engineering and Thin Films

Chemnitz University of Technology

Ferdinand-Braun-Institut

F. Fenske is an author at Fraunhofer Institute for Telecommunications, Heinrich Hertz Institute specializing in materials science, materials engineering, and semiconductor materials.

Publications per year

1989–2009

Publications

Electron microscopic characterization of reactively sputtered ZnO films with different Al-doping levels

I. Sieber, N. Wanderka, I. Urban et al. · Thin Solid Films · 1998 · 104 citations

Natural Sciences, Materials Engineering, Materials Science +16

Free-carrier plasma resonance effects and electron transport in reactively sputtered degenerate ZnO:Al films

S. Brehme, F. Fenske, W. Fuhs et al. · Thin Solid Films · 1999 · 97 citations

Natural Sciences, Materials Science, Physics +16

Polycrystalline silicon thin-film solar cells on glass

S. Gall, Christiane Becker, E. Conrad et al. · Solar Energy Materials and Solar Cells · 2009 · 84 citations

Engineering, Materials Engineering, Materials Science +12

Structure-function relationship between preferred orientation of crystallites and electrical resistivity in thin polycrystalline ZnO:Al films

M. Birkholz, B. Selle, F. Fenske et al. · Physical review. B, Condensed matter · 2003 · 67 citations

Natural Sciences, Materials Science, Physics +17

Development of a rapid thermal annealing process for polycrystalline silicon thin-film solar cells on glass

B. Rau, Tim Weber, B. Górka et al. · Materials Science and Engineering B · 2008 · 33 citations

Engineering, Materials Engineering, Materials Science +12

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