Concepedia

F. J. Hohn

FJ

Statistics

Publications

13

Citations

223

H-Index

12

Active since

1977

Affiliations

IBM Research - Thomas J. Watson Research Center(Current)

F. J. Hohn is an author at IBM Research - Thomas J. Watson Research Center specializing in engineering, applied physics, and electrical engineering.

Top concepts

EngineeringApplied PhysicsElectrical EngineeringMicroelectronicsMicrofabricationMicroscopyMaterial ScienceIntegrated CircuitsInstrumentationNanolithography

Publications per year

1977–2003

13

Publications

13

A vector-scan thermal-field emission nanolithography system

Mark Gesley, F. J. Hohn, R. Viswanathan et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1988 · 31 citations

High Resolution, Engineering, Electron-beam Lithography +16

A high performance 0.25 mu m CMOS technology

B. Davari, Wei‐Hsu Chang, M.R. Wordeman et al. · 2003 · 26 citations

Low-power Electronics, Electrical Engineering, High Performance 0.25 +12

100 kV thermal field emission electron beam lithography tool for high-resolution x-ray mask patterning

M. A. McCord, R. Viswanathan, F. J. Hohn et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1992 · 20 citations

Engineering, Electron-beam Lithography, Microscopy +20

Electron beam lithography: Its applications

F. J. Hohn · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1989 · 18 citations

Beam Profile, Electrical Engineering, Wafer Scale Processing +14

X-ray mask fogging by electrons backscattered beneath the membrane*

Kurt K. Christenson, R. Viswanathan, F. J. Hohn · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1990 · 18 citations

X-ray Spectroscopy, Thin Mask Membrane, Physics +12

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