Jonathan L. Partridge

Zn₂SbN₃: growth and characterization of a metastable photoactive semiconductor

Elisabetta Arca, John D. Perkins, Stephan Lany et al. · Materials Horizons · 2019 · 49 citations · Full text

Engineering, Materials Engineering, Materials Science +10

Thermal Atomic Layer Etching of Al₂O₃ Using Sequential HF and BCl₃ Exposures: Evidence for Combined Ligand-Exchange and Conversion Mechanisms

Austin M. Cano, Jonathan L. Partridge, Steven M. George · Chemistry of Materials · 2022 · 23 citations

Natural Sciences, Materials Engineering, Materials Science +17

Thermal Atomic Layer Etching of CoO, ZnO, Fe₂O₃, and NiO by Chlorination and Ligand Addition Using SO₂Cl₂ and Tetramethylethylenediamine

Jonathan L. Partridge, Jessica A. Murdzek, Virginia L. Johnson et al. · Chemistry of Materials · 2023 · 21 citations

Natural Sciences, Chemistry, Materials Science +15

Thermal Atomic Layer Etching of Molybdenum Using Sequential Oxidation and Deoxychlorination Reactions

Taewook Nam, Troy A. Colleran, Jonathan L. Partridge et al. · Chemistry of Materials · 2024 · 17 citations

Natural Sciences, Materials Engineering, Materials Science +14

Prediction and Validation of the Process Window for Atomic Layer Etching: HF Exposure on TiO₂

Suresh Kondati Natarajan, Austin M. Cano, Jonathan L. Partridge et al. · The Journal of Physical Chemistry C · 2021 · 13 citations

Natural Sciences, Materials Engineering, Materials Science +17