Jonathan L. Partridge

Author

University of Colorado Boulder ORCID

Also Known As

Jonathan L. Partridge, Jonathan Lawrence Partridge, Jonathan Partridge

Publications

160

Citations

H-Index

Concepts

All Affiliations

University of Colorado Boulder Schrodinger (United States)Aalto University University College Cork

About

Jonathan L. Partridge is an author at University of Colorado Boulder specializing in chemistry, engineering, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	4	4	98
2	Chemistry	4	4	98
3	Applied Physics	3	3	79
4	Chemical Engineering	3	3	51
5	Natural Sciences	1	1	47

Jonathan L. Partridge

Publications

131

Citations

H-Index

Page 1

	Year	Citations
Zn<sub>2</sub>SbN<sub>3</sub>: growth and characterization of a metastable photoactive semiconductor Elisabetta Arca, John D. Perkins, Stephan Lany, Materials Horizons SemiconductorsInorganic ChemistryIi-vi SemiconductorPhotoluminescenceEngineering	2019	47
Thermal Atomic Layer Etching of Al<sub>2</sub>O<sub>3</sub> Using Sequential HF and BCl<sub>3</sub> Exposures: Evidence for Combined Ligand-Exchange and Conversion Mechanisms Austin M. Cano, Jonathan L. Partridge, Steven M. George Chemistry of Materials Aluminium NitrideEngineeringAtomic Layer EtchingChemistryChemical Deposition	2022	20
Thermal Atomic Layer Etching of CoO, ZnO, Fe<sub>2</sub>O<sub>3</sub>, and NiO by Chlorination and Ligand Addition Using SO<sub>2</sub>Cl<sub>2</sub> and Tetramethylethylenediamine Jonathan L. Partridge, Jessica A. Murdzek, Virginia L. Johnson, Chemistry of Materials EngineeringOxidation ResistanceChemistryInorganic MaterialSurface Processing	2023	19
Prediction and Validation of the Process Window for Atomic Layer Etching: HF Exposure on TiO<sub>2</sub> Suresh Kondati Natarajan, Austin M. Cano, Jonathan L. Partridge, The Journal of Physical Chemistry C EngineeringAtomic Layer EtchingChemistryAle ProcessSurface Processing	2021	12
Spontaneous etching of B2O3 by HF gas studied using infrared spectroscopy, mass spectrometry, and density functional theory Austin M. Cano, Suresh Kondati Natarajan, Jonathan L. Partridge, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films	2022	11
Thermal atomic layer etching of CoO using acetylacetone and ozone: Evidence for changes in oxidation state and crystal structure during sequential exposures Jonathan L. Partridge, Varun Sharma, Jessica A. Murdzek, Applied Surface Science	2023	11
Thermal Atomic Layer Etching of Molybdenum Using Sequential Oxidation and Deoxychlorination Reactions Taewook Nam, Troy A. Colleran, Jonathan L. Partridge, Chemistry of Materials	2024	11

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