Concepedia

J. Shiozawa

JS

4

Publications

71

Citations

4

H-Index

1990

Active since

Affiliations

Toshiba (Japan)(Current)

J. Shiozawa is an author at Toshiba (Japan) specializing in applied physics, engineering, and materials science.

Top concepts

Publications per year

1990–2005

4

Publications

4

Multiscale Analysis of Silicon Low-Pressure Chemical Vapor Deposition

Shigeru Kinoshita, Shigeyuki Takagi, Tetsuya Kai et al. · Japanese Journal of Applied Physics · 2005 · 25 citations

, , +15

Characterization of stress in doped and undoped polycrystalline silicon before and after annealing or oxidation with laser raman spectroscopy

M. Kawata, Soichi Nadahara, J. Shiozawa et al. · Journal of Electronic Materials · 1990 · 20 citations

, , +7

Smoothing of the Si surface using CF4/O2 down-flow etching

Hirotaka Nishino, N. Hayasaka, Keiji Horioka et al. · Journal of Applied Physics · 1993 · 15 citations

, , +10

The Formation of Boron‐Doped Polycrystalline Si with Extremely Low Resistivities at Low Temperatures

J. Shiozawa, Yoshio Kasai, Yuu‐ichi Mikata et al. · Journal of The Electrochemical Society · 1994 · 11 citations

, , +17

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