Mitsuru Kekura

High-quality SiO2 film formation by highly concentrated ozone gas at below 600 °C

Tetsuya Nishiguchi, Hidehiko Nonaka, Shingo Ichimura et al. · Applied Physics Letters · 2002 · 44 citations

Natural Sciences, Materials Engineering, Materials Science +16

Development of a continuous generation/supply system of highly concentrated ozone gas for low-temperature oxidation process

Shingo Ichimura, Hidehiko Nonaka, Yoshiki Morikawa et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2004 · 23 citations

Engineering, Chemical Engineering, Hvac Systems +11

High Quality Gate Dielectric Film on Poly-Silicon Grown at Room Temperature using UV Light Excited Ozone

N. Kameda, Tetsuya Nishiguchi, Yoshiki Morikawa et al. · Journal of The Electrochemical Society · 2007 · 23 citations · Full text

Engineering, Electrical Engineering, Materials Science +15

8000-V 1000-A gate turn-off thyristor with low on-state voltage and low switching loss

Mitsuru Kekura, Hirokazu Akiyama, Marco Tani et al. · IEEE Transactions on Power Electronics · 1990 · 23 citations

Engineering, Electrical Engineering, Materials Science +9

Reactive oxygen beam generation system using pulsed laser evaporation of highly concentrated solid ozone

Tetsuya Nishiguchi, Yoshiki Morikawa, Mitsuru Kekura et al. · Review of Scientific Instruments · 2002 · 16 citations

Natural Sciences, Materials Engineering, Materials Science +17