H.J. Geipel

Composite silicide gate electrodes—Interconnections for VLSI device technologies

H.J. Geipel, Ning Hsieh, M.H. Ishaq et al. · IEEE Transactions on Electron Devices · 1980 · 62 citations

Engineering, Electrical Engineering, Materials Science +17

Dopant diffusion in tungsten silicide

Paihung Pan, Ning Hsieh, H.J. Geipel et al. · Journal of Applied Physics · 1982 · 39 citations

Engineering, Materials Engineering, Materials Science +17

Critical microstructure for ion-implantation gettering effects in silicon

H.J. Geipel, W. K. Tice · Applied Physics Letters · 1977 · 26 citations

Engineering, Materials Engineering, Materials Science +17

Composite Silicide Gate Electrodes - Interconnections for VLSI Device Technologies

H.J. Geipel, Ning Hsieh, M.H. Ishaq et al. · IEEE Journal of Solid-State Circuits · 1980 · 20 citations

Engineering, Electrical Engineering, Materials Science +17

Reduction of Leakage by Implantation Gettering in VLSI Circuits

H.J. Geipel, W. K. Tice · IBM Journal of Research and Development · 1980 · 17 citations

Engineering, Electrical Engineering, Materials Science +13