K. A. Ashtiani

Ionized physical-vapor deposition using a hollow-cathode magnetron source for advanced metallization

E. Klawuhn, G. C. D’Couto, K. A. Ashtiani et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2000 · 49 citations

Magnetic Properties, Engineering, Thin Film Process Technology +17

Characterization of magnetron-sputtered partially ionized aluminum deposition

D. B. Hayden, D. R. Juliano, K. M. Green et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 16 citations

Aluminium Nitride, Gridded Energy Analyzer, Engineering +16

<i>In situ</i> physical vapor deposition of ionized Ti and TiN thin films using hollow cathode magnetron plasma source

G. C. D’Couto, G. Tkach, K. A. Ashtiani et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2001 · 12 citations

Thin Film Physics, Magnetic Properties, Hcm Ti +16

A two-dimensional particle-in-cell simulation of an electron-cyclotron-resonance etching tool

K. A. Ashtiani, J. L. Shohet, W. N. G. Hitchon et al. · Journal of Applied Physics · 1995 · 11 citations

Engineering, Electron-beam Lithography, Microscopy +23