A. D. Lilak

3-D Self-aligned Stacked NMOS-on-PMOS Nanoribbon Transistors for Continued Moore’s Law Scaling

ChingYao Huang, G. Dewey, Ehren Mannebach et al. · 2020 · 106 citations

The effect of dose rate on interstitial release from the end-of-range implant damage region in silicon

L. S. Robertson, A. D. Lilak, Mark E. Law et al. · Applied Physics Letters · 1997 · 21 citations

Engineering, Superlattices Dsls, Range Defect Density +18

Kinetics of boron reactivation in doped silicon from Hall effect and spreading resistance techniques

A. D. Lilak, Mark E. Law, Ljubo Radic et al. · Applied Physics Letters · 2002 · 20 citations

Engineering, Silicon On Insulator, Boron Implants +18

A physics-based modeling approach for the simulation of anomalous boron diffusion and clustering behaviors

A. D. Lilak, Susan Earles, K. S. Jones et al. · 2002 · 18 citations

Engineering, Simulation, Computational Mechanics +26

Evolution of {311} type defects in boron-doped structures: Experimental evidence of boron–interstitial cluster formation

A. D. Lilak, Susan Earles, Mark E. Law et al. · Applied Physics Letters · 1999 · 15 citations

Materials Science, Semiconductors, Boron–interstitial Cluster Formation +15