Kati Kühnel - Concepedia

Concepedia

Author

Kati Kühnel

Fraunhofer Institute for Photonic Microsystems

Also Known As

K Khnel, K. Kuhnel, K. Kühnel, Kati Kuhnel, Kati Kühnel

58

Publications

1.4K

Citations

21

H-Index

51

Concepts

All Affiliations

Fraunhofer Institute for Photonic Microsystems Technische Universität Dresden GlobalFoundries (Germany)Complexity and Topology in Quantum Matter IMEC

KK

About

Kati Kühnel is an author at Fraunhofer Institute for Photonic Microsystems specializing in applied physics, engineering, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	19	29	1.3K
2	Applied Physics	19	29	1.3K
3	Computer Engineering	4	4	84
4	Chemistry	2	2	40
5	Chemical Engineering	1	1	44

Kati Kühnel

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37

Publications

1.4K

Citations

21

H-Index

	Year	Citations
High Endurance Ferroelectric Hafnium Oxide-Based FeFET Memory Without Retention Penalty Tarek Ali, P. Polakowski, S. Riedel, IEEE Transactions on Electron Devices Materials ScienceMagnetismElectrical EngineeringSemiconductor TechnologyEngineering	2018	278
Silicon doped hafnium oxide (HSO) and hafnium zirconium oxide (HZO) based FeFET: A material relation to device physics Tarek Ali, P. Polakowski, S. Riedel, Applied Physics Letters EngineeringSilicon On InsulatorHafnium Zirconium OxideSemiconductor DeviceFerroelectric Application	2018	138
A Multilevel FeFET Memory Device based on Laminated HSO and HZO Ferroelectric Layers for High-Density Storage Tarek Ali, P. Polakowski, Kati Kühnel, Non-volatile MemoryEngineeringEmerging Memory TechnologyFerroelectric Random-access MemoryMagnetism	2019	134
Back‐End‐of‐Line Compatible Low‐Temperature Furnace Anneal for Ferroelectric Hafnium Zirconium Oxide Formation David Lehninger, Ricardo Olivo, Tarek Ali, physica status solidi (a) Materials ScienceMaterials EngineeringFerromagnetismMagnetic PropertiesEngineering	2020	100
Ferroelectric and pyroelectric properties of polycrystalline La-doped HfO2 thin films Clemens Mart, Kati Kühnel, Thomas Kämpfe, Applied Physics Letters Materials ScienceSemiconductorsMultiferroicsEngineeringElectronic Materials	2019	63
High-density energy storage in Si-doped hafnium oxide thin films on area-enhanced substrates Kati Kühnel, M. Czernohorsky, Clemens Mart, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena Materials ScienceEnergy Storage EfficiencyElectrical EngineeringEpitaxial GrowthEngineering	2019	44
Spectroscopic analysis of ultra-thin TiN as a diffusion barrier for lithium-ion batteries by ToF-SIMS, XPS, and EELS Alireza M. Kia, Jan Speulmanns, Sascha Bönhardt, Applied Surface Science EngineeringChemical DepositionChemical EngineeringOn-chip IntegrationEnergy Storage Devices	2021	44
Optimizing Ferroelectric and Interface Layers in HZO-Based FTJs for Neuromorphic Applications Ayse Sünbül, Tarek Ali, Konstantin Mertens, IEEE Transactions on Electron Devices Non-volatile MemoryEngineeringFtj MemoryEmerging Memory TechnologyInterface Layers	2021	38
Piezoelectric Response of Polycrystalline Silicon‐Doped Hafnium Oxide Thin Films Determined by Rapid Temperature Cycles Clemens Mart, Thomas Kämpfe, Raik Hoffmann, Advanced Electronic Materials EngineeringPiezoelectric CoefficientElectronic DevicesFerroelectric ApplicationNanoelectronics	2020	36
Integration of Hafnium Oxide on Epitaxial SiGe for p-type Ferroelectric FET Application Maximilian Lederer, Franz Müller, Kati Kühnel, IEEE Electron Device Letters Materials EngineeringMaterials ScienceElectrical EngineeringHafnium OxideNon-volatile Memories	2020	29

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