Concepedia
Statistics
Publications
8
Citations
397
H-Index
Active since
1966
Affiliations
Philips (Netherlands)(Current)
NXP (Netherlands)
Philips (United States)
Philips (Finland)
D. P. Oosthoek is an author at Philips (Netherlands) specializing in physics, applied physics, and engineering.
Top concepts
PhysicsEngineeringApplied PhysicsInstrumentationMaterial ScienceMicroelectronicsNatural SciencesParticle PhysicsElectrical EngineeringNanoelectronics
Publications per year
1966–1984
Concentration profiles of boron implantations in amorphous and polycrystalline silicon
W. K. Hofker, D. P. Oosthoek, N. J. Koeman et al. · Radiation Effects · 1975 · 111 citations
Materials Science, Ion Implantation, Engineering +13
Influence of annealing on the concentration profiles of boron implantations in silicon
W. K. Hofker, H. W. Werner, D. P. Oosthoek et al. · Applied Physics A · 1973 · 99 citations
Materials Engineering, Materials Science, Concentration Profiles +10
Boron implantations in silicon: A comparison of charge carrier and boron concentration profiles
W. K. Hofker, H. W. Werner, D. P. Oosthoek et al. · Applied Physics A · 1974 · 75 citations
Electrical Engineering, Ion Implantation, Engineering +11
The Checker Board Counter: A Semiconductor dE/dx Detector with Position Indication
W. K. Hofker, D. P. Oosthoek, A. M. E. Hoeberechts et al. · IEEE Transactions on Nuclear Science · 1966 · 38 citations
Engineering, Nuclear Physics, Measurement +23
Profiles of boron implantations in silicon measured by secondary ion mass spectrometry
W. K. Hofker, H. W. Werner, D. P. Oosthoek et al. · Radiation Effects · 1973 · 35 citations
Ion Implantation, Boron Profiles, Physics +10
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