Influence of annealing on the concentration profiles of boron implantations in silicon - Concepedia

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Influence of annealing on the concentration profiles of boron implantations in silicon

99

Citations

10

References

1973

Year

W. K. Hofker, H. W. Werner, D. P. Oosthoek, H. A. M. de Grefte

Applied Physics A

Materials EngineeringMaterials ScienceConcentration ProfilesEngineeringPhysicsNanoelectronicsApplied PhysicsSemiconductor Device FabricationAmorphous SolidSilicon On InsulatorMicroelectronicsBoron ImplantationsSemiconductor Device

References

	Year	Citations

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