J. A. Seifferly - Concepedia

Author

J. A. Seifferly

Also Known As

J. A. Seifferly, J.A. Seifferly

Publications

Citations

H-Index

Concepts

All Affiliations

J. A. Seifferly is an author at Corning (United States) specializing in applied physics, engineering, and thin films.

#	Concept	H-Index	Publications	Citations
1	Engineering	2	2	73
2	Applied Physics	2	2	73
3	Materials Science	2	2	73
4	Chemistry	1	1	54
5	Electronic Devices	1	1	54

J. A. Seifferly

Publications

Citations

H-Index

Page 1

	Year	Citations
Plasma-enhanced chemical vapor deposition of <i>a</i>-SiC:H films from organosilicon precursors Mark J. Loboda, J. A. Seifferly, Fred Dall Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceElectronic DevicesDielectric ConstantElectronic MaterialsEngineering	1994	54
Chemical influence of inert gas on the thin film stress in plasma-enhanced chemical vapor deposited <i>a</i>-SiN: H films Mark J. Loboda, J. A. Seifferly Journal of materials research/Pratt's guide to venture capital sources Materials ScienceInert GasThin Film PhysicsChemical InfluenceEngineering	1996	19
Safe Precursor Gas for Broad Replacement of SiH<sub>4</sub>in Plasma Processes Employed in Integrated Circuit Production Mark J. Loboda, J. A. Seifferly, Christopher Grove, MRS Proceedings	1996	14

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