Concepedia

J. A. Seifferly

JA

3

Publications

87

Citations

3

H-Index

1994

Active since

Affiliations

Corning (United States)(Current)

J. A. Seifferly is an author at Corning (United States) specializing in applied physics, engineering, and thin films.

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Publications per year

1994–1996

3

Publications

3

Plasma-enhanced chemical vapor deposition of <i>a</i>-SiC:H films from organosilicon precursors

Mark J. Loboda, J. A. Seifferly, Fred Dall · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1994 · 54 citations

, , +14

Chemical influence of inert gas on the thin film stress in plasma-enhanced chemical vapor deposited <i>a</i>-SiN: H films

Mark J. Loboda, J. A. Seifferly · Journal of materials research/Pratt's guide to venture capital sources · 1996 · 19 citations

, , +10

Safe Precursor Gas for Broad Replacement of SiH<sub>4</sub>in Plasma Processes Employed in Integrated Circuit Production

Mark J. Loboda, J. A. Seifferly, Christopher Grove et al. · MRS Proceedings · 1996 · 14 citations

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