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Chemical influence of inert gas on the thin film stress in plasma-enhanced chemical vapor deposited <i>a</i>-SiN: H films

Materials ScienceInert GasThin Film PhysicsChemical InfluenceEngineeringThin Film StressSurface ScienceApplied PhysicsThin Film Process TechnologyThin FilmsChemical Vapor DepositionPlasma ProcessingThin Film Processing