Concepedia
Statistics
Publications
43
Citations
1.4K
H-Index
22
Active since
1987
Affiliations
Corning (United States)(Current)
Dow Chemical (Japan)
Stony Brook University
University of Cincinnati
RTX (United States)
Mark J. Loboda is an author at Corning (United States) specializing in materials science, materials engineering, and engineering.
Publications per year
1987–2015
Properties of a ‐ SiO x : H Thin Films Deposited from Hydrogen Silsesquioxane Resins
Mark J. Loboda, Christopher Grove, R. F. Schneider · Journal of The Electrochemical Society · 1998 · 175 citations
Natural Sciences, Materials Engineering, Materials Science +17
New solutions for intermetal dielectrics using trimethylsilane-based PECVD processes
Mark J. Loboda · Microelectronic Engineering · 2000 · 95 citations
Natural Sciences, Materials Engineering, Materials Science +12
Growth of crystalline 3C-SiC on Si at reduced temperatures by chemical vapor deposition from silacyclobutane
A. J. Steckl, Cailei Yuan, J. P. Li et al. · Applied Physics Letters · 1993 · 80 citations
Engineering, Materials Engineering, Materials Science +17
Heteroepitaxial Growth of SiC on Si(100) and (111) by Chemical Vapor Deposition Using Trimethylsilane
S. Madapura, A. J. Steckl, Mark J. Loboda · Journal of The Electrochemical Society · 1999 · 71 citations
Extremely low-phase-noise SAW resonators and oscillators: design and performance
G.K. Montress, T.E. Parker, Mark J. Loboda et al. · IEEE Transactions on Ultrasonics Ferroelectrics and Frequency Control · 1988 · 70 citations
Engineering, Electrical Engineering, Physics +17
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