Safe Precursor Gas for Broad Replacement of SiH<sub>4</sub>in Plasma Processes Employed in Integrated Circuit Production - Concepedia

Concepedia

Publication | Closed Access

Safe Precursor Gas for Broad Replacement of SiH<sub>4</sub>in Plasma Processes Employed in Integrated Circuit Production

14

Citations

1

References

1996

Year

Mark J. Loboda, J. A. Seifferly, Christopher Grove, Ryan F. Schneider

MRS Proceedings

References

	Year	Citations

Page 1