C. S. Hsiung

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Active since

2000

Affiliations

United Microelectronics (Taiwan)(Current)

National Tsing Hua University

C. S. Hsiung is an author at United Microelectronics (Taiwan) specializing in materials science, metallic materials, and thin film electrical properties.

Publications per year

2000–2002

Publications

Ta and Ta–N diffusion barriers sputtered with various N2/Ar ratios for Cu metallization

J. H. Wang, L. J. Chen, Zhenchuan Lu et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 23 citations

Natural Sciences, Materials Engineering, Materials Science +17

Effects of a new combination of additives in electroplating solution on the properties of Cu films in ULSI applications

Jiumei Hu, T. C. Chang, Chia‐Hua Wu et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2000 · 22 citations

Natural Sciences, Materials Engineering, Materials Science +11

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