H. Umimoto

SMART-P: rigorous three-dimensional process simulator on a supercomputer

S. Odanaka, H. Umimoto, M. Wakabayashi et al. · IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems · 1988 · 44 citations

Engineering, Numerical Process Modeling, Computer Architecture +16

A 0.05 μm-CMOS with ultra shallow source/drain junctions fabricated by 5 keV ion implantation and rapid thermal annealing

Atsushi Hori, H. Nakaoka, H. Umimoto et al. · 2002 · 37 citations

Low-power Electronics, Electrical Engineering, Semiconductor Device +13

Depth Profiles of Boron Atoms with Large Tilt‐Angle Implantations

G. Fuse, H. Umimoto, S. Odanaka et al. · Journal of The Electrochemical Society · 1986 · 27 citations

Materials Science, Ion Implantation, Boron Nitride +12

Numerical simulation of stress-dependent oxide growth at convex and concave corners of trench structures

H. Umimoto, S. Odanaka, I. Nakao · IEEE Electron Device Letters · 1989 · 23 citations

Materials Science, Oxide Thinning, Engineering +15

Three-dimensional numerical simulation of local oxidation of silicon

H. Umimoto, S. Odanaka · IEEE Transactions on Electron Devices · 1991 · 23 citations

Engineering, Oxidation Resistance, Silicon On Insulator +23