Akifumi Tokimasa

At-Wavelength Extreme Ultraviolet Lithography Mask Observation Using a High-Magnification Objective with Three Multilayer Mirrors

Mitsunori Toyoda, Kenjiro Yamasoe, Tadashi Hatano et al. · Applied Physics Express · 2012 · 24 citations

Natural Sciences, Physics, Optics +15

Development of Coherent Extreme-Ultraviolet Scatterometry Microscope with High-Order Harmonic Generation Source for Extreme-Ultraviolet Mask Inspection and Metrology

Masato Nakasuji, Akifumi Tokimasa, Tetsuo Harada et al. · Japanese Journal of Applied Physics · 2012 · 15 citations

Natural Sciences, Manufacturing Engineering, Physics +15

Development of Coherent Extreme-Ultraviolet Scatterometry Microscope with High-Order Harmonic Generation Source for Extreme-Ultraviolet Mask Inspection and Metrology

Masato Nakasuji, Akifumi Tokimasa, Tetsuo Harada et al. · Japanese Journal of Applied Physics · 2012 · 15 citations

Natural Sciences, Manufacturing Engineering, Physics +15

Defect Characterization of an Extreme-Ultraviolet Mask Using a Coherent Extreme-Ultraviolet Scatterometry Microscope

Tetsuo Harada, Masato Nakasuji, Akifumi Tokimasa et al. · Japanese Journal of Applied Physics · 2012 · 14 citations

Natural Sciences, Materials Science, Physics +13

Demonstrating 30-nm spatial resolution of three-multilayer-mirror objective for extreme ultraviolet microscopy: Imaging test by observing lithography mask

Mitsunori Toyoda, Kenjiro Yamasoe, Akifumi Tokimasa et al. · Applied Physics Express · 2014 · 12 citations

Engineering, Biomedical Engineering, Biomedical Imaging +12