Yosuke Shimamune

Atomic-layer adsorption of P on Si(100) and Ge(100) by PH3 using an ultraclean low-pressure chemical vapor deposition

Yosuke Shimamune, Masao Sakuraba, Takashi Matsuura et al. · Applied Surface Science · 2000 · 28 citations

Natural Sciences, Chemistry, Materials Science +14

Atomic-layer doping in Si by alternately supplied PH3 and SiH4

Yosuke Shimamune, Masao Sakuraba, Takashi Matsuura et al. · Thin Solid Films · 2000 · 19 citations

Engineering, Materials Engineering, Materials Science +12

Formation of heavily P-doped Si epitaxial film on Si(1 0 0) by multiple atomic-layer doping technique

Yosuke Shimamune, Masao Sakuraba, Junichi Murota et al. · Applied Surface Science · 2003 · 18 citations

Engineering, Materials Engineering, Materials Science +14

Embedded silicon germanium (eSiGe) technologies for 45nm nodes and beyond

Naoyoshi Tamura, Yosuke Shimamune, Hirotaka Maekawa · 2008 · 17 citations

Engineering, Electrical Engineering, Materials Science +16

Si self-diffusivity using isotopically pure 30Si epitaxial layers

Siti Rahmah Aid, T. Sakaguchi, K. Toyonaga et al. · Materials Science and Engineering B · 2004 · 15 citations

Engineering, Materials Engineering, Materials Science +15